发明名称 MANUFACTURING METHOD FOR IMAGE DISPLAY UNIT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method for an image display unit comprising an active matrix substrate having a high-performance thin film transistor circuit which operates with high-speed mobility as a drive circuit for driving pixels arranged in a matrix pattern. <P>SOLUTION: An active matrix substrate SUB1 constituting the image display unit has a drive circuit region DAR1 around its pixel region PAR. A polysilicon film is formed in the drive circuit region DAR1. The polysilicon film is scanned and irradiated with pulse-modulated laser light or pseudo CW laser light. Thereby, a discontinuous modified region of a substantially band-shaped crystalline silicon film, modified so that the region has grain boundaries continued in the direction of scanning is formed. A drive circuit having active elements, such as thin film transistors, is formed in virtual tiles TL, formed in the discontinuous modified region, so that the direction of its channels is matched with the direction of crystal growth in the substantially band-shaped crystalline silicon film. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004056058(A) 申请公布日期 2004.02.19
申请号 JP20020215239 申请日期 2002.07.24
申请人 HITACHI LTD 发明人 HATANO MUTSUKO;YAMAGUCHI SHINYA;SHIBA TAKEO;TAI MITSUHARU;AKIMOTO HAJIME
分类号 G02F1/1362;G02F1/1368;H01L21/20;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/04;H01L29/786;(IPC1-7):H01L21/20;G02F1/136 主分类号 G02F1/1362
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