发明名称 |
SURFACE UNEVENNESS FORMING METHOD, OPTICAL FILM AND DIFFUSE REFLECTION PLATE EACH OBTAINED BY THE SAME AND METHOD FOR MANUFACTURING DIFFUSE REFLECTION PLATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for easily and stably obtaining a surface uneven shape having a through hole at low cost and to provide an optical film and a diffuse reflection plate using the same. <P>SOLUTION: The surface unevenness forming method is achieved by sequentially carrying out a group (A) of surface unevenness forming steps including a step for forming an energy-sensitive negative resin composition layer containing one or more polymerizable monomers or oligomers, a step for irradiating the layer once or more with active energy rays through a patterned mask and a step for postbaking the layer without carrying out etching and a group (B) of through hole forming steps including a step for irradiating the energy-sensitive negative resin composition layer once or more with active energy rays through a mask in which a light shielding pattern for a through hole has been formed and a step for removing the layer in the through hole portion by prescribed etching. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004037521(A) |
申请公布日期 |
2004.02.05 |
申请号 |
JP20020190515 |
申请日期 |
2002.06.28 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
IWAMURO MITSUNORI;TAI SEIJI;TSURUOKA YASUO;KIZAWA KEIKO |
分类号 |
G02F1/1335;C08J5/18;G03F7/38 |
主分类号 |
G02F1/1335 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|