发明名称 |
CASEIN RESIN COMPOSITION FOR PHOTORESIST |
摘要 |
PURPOSE: A casein resin composition for photoresist, a photoresist composition using the resin composition and its preparation method are provided, to improve the resolution and the sensitivity of photoresist. CONSTITUTION: The casein resin composition comprises 8-15 wt% of acidic casein powder; 0.1-3 wt% of an ammonium salt or an amine substituted with at least one ethanol as a thickener 0.1-5 wt% of a hydroxide of an alkali metal or ammonium, an alkali metal salt or a borate as a pH controller; 0-1 wt% of a compound selected from the group consisting of formaldehyde, phenol and zeolite as a preservation stabilizer; 0-2 wt% of an anthraquinone compound or an amide compound as a light intensifier; and the balance of deionized water.
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申请公布号 |
KR20030094536(A) |
申请公布日期 |
2003.12.18 |
申请号 |
KR20020031269 |
申请日期 |
2002.06.04 |
申请人 |
A&D PLUS CO., LTD.;IL DONG CHEMICAL CO., LTD. |
发明人 |
KIM, GANG SEOK;KIM, YEONG SIK;YUM, DAE IL |
分类号 |
G03F7/032;(IPC1-7):G03F7/032 |
主分类号 |
G03F7/032 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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