发明名称 LPP LIGHT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide EUV light equipment having a high repetition frequency and high output by increasing the amount of supply of a target. SOLUTION: In the LPP light equipment, the target is irradiated with an excitation laser beam (32), and the excitation laser beam is changed into plasma for generating an extreme ultraviolet rays (13) in an extreme ultraviolet-ray region. The LPP light equipment has an excitation laser apparatus (25) for condensing and applying the excitation laser beam (32) to an irradiation point (29). The target made of liquefied xenon (Xe) is jetted from a plurality of nozzles toward the irradiation point (29) as a target jet (27). As a result, the amount of supply of the target jet (27) is increased, and the irradiation point (29) is irradiated with the condensed excitation laser beam (32), thus obtaining the extreme-ultraviolet ray (13) having the high repetition frequency and high output. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003303764(A) 申请公布日期 2003.10.24
申请号 JP20020110393 申请日期 2002.04.12
申请人 GIGAPHOTON INC 发明人 TANAKA HIROKAZU;MIZOGUCHI KAZU
分类号 G21K5/00;G21K5/02;G21K5/08;H01L21/027;H05G1/00;H05G2/00;(IPC1-7):H01L21/027 主分类号 G21K5/00
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