| 摘要 |
PURPOSE: A vacuum arc vapor deposition method and an apparatus for forming a thin film over a surface of a substrate to improve a weary resistance property of such a substrata as an automobile part, machine part, machine tool, and metal mold are provided. CONSTITUTION: The vacuum arc vapor deposition apparatus comprises a film forming chamber in which a substrate is located; a curved or bent duct; at lease one of evaporating source being located at one end of the duct, the evaporating source including cathode material, which is evaporated by arc discharge in a vacuum; a plasma injection hole being located at the other end of the duct and communicatively connected to the film forming chamber; and a magnetic filter formed by disposing a plurality of magnets at a plurality of locations along and around the duct, the plurality of magnets including a terminal magnet located closest to the plasma injection hole, the magnetic filter generating a deflection magnetic field within the duct, the magnetic filter transporting a stream of plasma including ions of the cathode material from one end of the duct to the plasma injection hole while removing droplets generated by the evaporation of the cathode material, the ions of the plasma stream being extracted from the plasma injection hole into the film forming chamber, the ions being attractively guided onto the substrate, whereby the cathode material is vapor deposited on the substrate, wherein, the terminal magnet located closest to the plasma injection hole is set to incline to a plasma injection plane of the plasma injection hole.
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