| 摘要 |
<p>PROBLEM TO BE SOLVED: To solve such a problem that, when a pattern of a resist mask is formed with light, the exposure light passes through a glass substrate and is reflected from a stage to decrease the accuracy of pattern forming. SOLUTION: When the resist pattern is to be formed, the photomask substrate is mounted on a stage having an antireflective effect for the exposure light to form the pattern. Alternatively, the stage where the photomask is to be mounted in the exposure system is subjected to the antireflection treatment for the exposure light.</p> |
