METHOD FOR MAKING CRYSTALLINE THIN FILM

摘要

PROBLEM TO BE SOLVED: To realize a technique of enabling the use of a substrate having a melting temperature and a decomposition temperature lower than the certain temperatures because heat treatment or substrate heating is conventionally necessary to make a thin film of a crystalline high-melting compound such as an oxide, a nitride, or a carbide. SOLUTION: This method for making a crystalline thin film is the one in which the use of a low-melting low-decomposition-temperature substrate is possible by impinging a high-strength pulse ion beam against a high-melting compound target and building up the compound on the substrate.