| 发明名称 |
Negative- acting aqueous photoresist composition |
| 摘要 |
The invention relates to a novel negative, aqueous photoresist composition comprising a polyvinylacetal polymer, a water-soluble photoactive compound and a crosslinking agent. The water-soluble photoactive compound is preferably a sulfonium salt. The invention also relates to forming a negative image from the novel photoresist composition.
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| 申请公布号 |
US2003077539(A1) |
申请公布日期 |
2003.04.24 |
| 申请号 |
US20010966958 |
申请日期 |
2001.09.28 |
| 申请人 |
LU PING-HUNG;NEISSER MARK O.;DAMMEL RALPH R.;WU HENGPENG |
发明人 |
LU PING-HUNG;NEISSER MARK O.;DAMMEL RALPH R.;WU HENGPENG |
| 分类号 |
G03F7/039;G03F7/004;G03F7/038;G03F7/32;H01L21/027;(IPC1-7):G03F7/039;G03F7/30;G03F7/40 |
主分类号 |
G03F7/039 |
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