发明名称 Automatic analyzing/controlling device for electroless composite plating solution
摘要 An automatic analysis and control system for electroless composite plating solution for automatically analyzing an electroless composite plating solution and performing such a control as to obtain an appropriate bath composition and/or use conditions, wherein, as a technique for measuring the concentration of a metallic component in the plating solution by absorptiometry, the system includes a mechanism for measuring transmissivity or absorbance at least two or more different wavelengths after the plating solution is automatically introduced into an analytical cell, and a mechanism for calculating the objective concentration from the measured values and displaying the calculation results.
申请公布号 US2003049169(A1) 申请公布日期 2003.03.13
申请号 US20020031461 申请日期 2002.01.22
申请人 CHIBA TADASHI;MONDEN KOJI;YOSHIKAWA KAZUKI;TACHIBANA SHINJI 发明人 CHIBA TADASHI;MONDEN KOJI;YOSHIKAWA KAZUKI;TACHIBANA SHINJI
分类号 C23C18/16;G01N21/31;(IPC1-7):G01N35/00 主分类号 C23C18/16
代理机构 代理人
主权项
地址