The invention relates to a mask which is improved in terms of production and handling, and which is especially to be used in electron projection lithography. The invention also relates to a method for producing one such mask.
申请公布号
WO03014829(A1)
申请公布日期
2003.02.20
申请号
WO2002EP07824
申请日期
2002.07.13
申请人
TEAM NANOTEC GMBH;BAYER, THOMAS;GRESCHNER, JOHANN;KALT, SAMUEL;WEISS, HELGA
