发明名称 |
Vertical replacement gate (VRG) MOSFET with a conductive layer adjacent a source/drain region and method of manufacture therefor |
摘要 |
The present invention provides a VRG structure formed on a semiconductor wafer substrate. The VRG structure has a first source/drain region located in a semiconductor wafer substrate, and a conductive layer located adjacent the source/drain region, a second source/drain region and a conductive channel that extends from the first source/drain region to the second source/drain region. The conductive layer provides an electrical connection to the first source/drain region. The conductive layer may have a low sheet resistance that may be less than about 50 OMEGA/square or less than about 20 OMEGA/square, to the first source/drain region.
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申请公布号 |
US6518622(B1) |
申请公布日期 |
2003.02.11 |
申请号 |
US20000528753 |
申请日期 |
2000.03.20 |
申请人 |
AGERE SYSTEMS INC. |
发明人 |
CHEW HONGZONG;CHYAN YIH-FENG;HERGENROTHER JOHN M.;MA YI;MONROE DONALD P. |
分类号 |
H01L29/41;H01L21/3205;H01L21/336;H01L21/8234;H01L23/52;H01L27/088;H01L29/78;(IPC1-7):H01L29/76 |
主分类号 |
H01L29/41 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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