发明名称 |
Plasma semiconductor processing system and method |
摘要 |
An apparatus to perform semiconductor processing includes a process chamber; a plasma generator for generating a plasma in the process chamber; and a helical ribbon electrode coupled to the output of the plasma generator.
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申请公布号 |
US2003008500(A1) |
申请公布日期 |
2003.01.09 |
申请号 |
US20010898439 |
申请日期 |
2001.07.05 |
申请人 |
NGUYEN TUE;NGUYEN TAI DUNG |
发明人 |
NGUYEN TUE;NGUYEN TAI DUNG |
分类号 |
C23C16/509;H01J37/32;H01L21/285;(IPC1-7):H01L21/476 |
主分类号 |
C23C16/509 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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