发明名称 ANALYZER CHAMBER OF ION IMPLANTATION EQUIPMENT
摘要 PURPOSE: An analyzer chamber of ion implantation chamber is provided to exchange only a damaged part of the analyzer chamber when the analyzer chamber is damaged by rapid movement of ion beams. CONSTITUTION: An analyzer chamber(231) of a mass analyzer is formed with a main body(233), a chamber head(232), and a combination portion and a leak prevention member(240). A combination hole(238) is formed at an edge of one end portion of the main body(233). The combination hole(238) is combined with the chamber head(232). An ion outlet(239) is formed at the other end portion of the main body(233). A through-hole(234) is formed at an end portion of one side of the chamber head(232). The through-hole(234) faces the combination hole(238). An O-ring is formed at an end portion of the other side of the chamber head(232). An ion inlet(237) is formed at a center of the chamber head(232). A combination portion is formed with the combination hole(238), the through-hole(234), and a combination bolt(235). The O-ring is used as a leak prevention member(240).
申请公布号 KR20020084445(A) 申请公布日期 2002.11.09
申请号 KR20010023710 申请日期 2001.05.02
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SONG, HO GI
分类号 H01L21/265;(IPC1-7):H01L21/265 主分类号 H01L21/265
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