Method for fabricating mgo polycrystalline thin film

摘要

A polycrystalline thin film of MgO is formed on a substrate by an ion sputtering process wherein the thin film is obtained by irradiating a target with an ion beam to dislodge particles from the target and deposit the particles on the substrate. The film is preferably formed in an atmosphere at a reduced pressure of 3.0x10-2 Pa or lower while keeping the substrate temperature at 300° C. or lower.