| 摘要 |
The present invention describes a plasma generating device comprising a wave guide; a radiative part having slot antennas, each of said slot antennas being adapted to radiate electromagnetic radiation; and a plasma generation chamber being connected to the radiative part via a window made of a dielectric material and being adapted to receive the electromagnetic radiation from the slot antennas; wherein the dimensions of the radiative part are locally modified or are locally changeable, so that the actual wavelength of the microwave is allowed to be locally changed, thereby the amplitude distribution of the electromagnetic radiation towards the plasma generation chamber can be controlled. The present invention also describes a plasma processing apparatus including such a plasma generating device.
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