| 摘要 |
In a chemical-mechanical planarization apparatus (100), a pad spindle includes a pad chuck (500) operative for selective attachment and detachment of a polishing pad (540). The pad chuck (500) includes s a plurality of pivoting links (522) (524), which cooperate to provide a clamping action to retain the polishing pad (540). A detachment station including annular member (570) engages the pivoting links (522) (524) to detach the polishing pad (540).
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