MALEIMIDE COMPOUND AND METHOD FOR PRODUCING THE SAME

摘要

PROBLEM TO BE SOLVED: To obtain a maleimide compound useful as a monomer for a photoresist excellent in dry etching resistance. SOLUTION: Maleic acid or its derivative is reacted with a compound of a compound represented by formula (II) (ring Z is an ortho-condensed alicyclic hydrocarbon ring which may contain a substituent group (a 1-4C alkyl group or the like) or the like; X is an alkylene group; n is 0 or 1) to produce a maleimide compound represented by formula (I) containing a polycyclic structure as an N-substituent group.