NAPHTHOQUINONE-DIAZID-BASED CALIX ESTER PHOTOSENSITIVE AGENT FOR PS PANEL AND PROCESS FOR PRODUCING THE SAME

摘要

PURPOSE: Provided are 2-diazo-1-naphthoquinone-5-sulfonyl acid ester, as a photosensitive compound, excellent in substitution rate and photosensitive ability and a photosensitive agent containing the photosensitive compound, which can be used for PS panels. CONSTITUTION: The 2-diazo-1-naphthoquinone-5-sulfonyl acid ester represented by the formula(1) is produced by reacting sodium 2-diazonaphthoquinone-5-sulfonyl chloride with calix£4|resorcinarene represented by the formula(2-1) or calix£4|pyrogallene represented by the formula(2-2), wherein the sodium 2-diazonaphthoquinone-5-sulfonyl chloride is obtained from sodium 2-diazonaphthoquinone-5-sulfonate. In the formula, A is hydrogen or a hydroxyl group.