发明名称 Structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters
摘要 The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.
申请公布号 US2002006557(A1) 申请公布日期 2002.01.17
申请号 US20010947647 申请日期 2001.09.05
申请人 MICHIELS JOHN;WELLS DAVID;KNAPPENBERGER ERIC J.;ALWAN JAMES J. 发明人 MICHIELS JOHN;WELLS DAVID;KNAPPENBERGER ERIC J.;ALWAN JAMES J.
分类号 G03F1/14;G03F7/00;H01J9/02;H01L21/027;H01L21/308;H01L21/311;(IPC1-7):G03F9/00 主分类号 G03F1/14
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