ALIGNMENT OF WAFER IN ISO-PROPYL ALCOHOL VAPOR DRYER

摘要

PURPOSE: An alignment of a wafer in an iso-propyl alcohol vapor dryer is provided to improve reliability of a dry process by preventing a water mark generated on a surface of a wafer located on an end position of the outside. CONSTITUTION: Front sides(101) of 25 wafers(100) are directed to a left direction. Back sides of 25 wafers(100) are directed to a right direction. A dummy wafer(200) is aligned at an end position of the left direction. The next 25 wafers(100) are aligned and the next dummy wafer(200) is aligned. A front side(101) of the wafer(100) located in an end position of the left side is protected from pollution such as water mark by an aligning state of the wafers(100) and an aligning state of the dummy wafer(200) when the wafers(100) and the dummy wafer(200) are inputted into an iso-propyl alcohol vapor dryer or the wafers(100) and the dummy wafer(200) are exposed in air.