| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an apparatus capable of precisely and quickly measuring optical characteristics at a usage wavelength on an optical element to be used in an X-ray region at a low cost, so as to solve problems such as a high device cost and an enormous size of a radiation beam type optical element evaluating device actually using an X-ray around a usage wavelength for evaluation or a long measurement time and deterioration in accuracy, due to lowered S/N ratio caused by reduction in the light amount of an X-ray radiated on the measured optical element due to a low diffraction efficiency in an evaluation device emitting a continuous spectrum from a laser plasma X-ray source and dispersing it by a diffraction grating for evaluation. SOLUTION: As a light source, X-rays radiated from a plasma is used, and a multilayer reflection mirror and a multilayer filter are used for obtaining X-ray at the desired wavelength.</p> |
