发明名称 Verfahren zur Beschichtung von Apparaten und Apparateteilen für den chemischen Anlagenbau
摘要 The invention relates to a method for surface-coating apparatuses and parts of apparatuses for the construction of chemical installations, for example apparatus, container and reactor walls, discharging devices, fittings, pumps, filters, compressors, centrifuges, columns, heat exchangers, dryers, reducing machines, built-in parts, packing and mixing mechanisms. The method is characterised in that bumps with an average height of 100 nm to 50 mu m are produced on the surface to be coated, at average intervals of 100 nm to 100 mu m, before the surface is coated by currentlessly depositing a layer of metal or a layer of a metal-polymer-dispersion using a galvanisation bath containing a metal electrolyte, a reduction agent and optionally, a polymer or polymer mixture to be deposited, in dispersed form.
申请公布号 DE10016215(A1) 申请公布日期 2001.10.04
申请号 DE2000116215 申请日期 2000.03.31
申请人 BASF AG 发明人 HUEFFER, STEPHAN;KREBS, THILO;HUNGENBERG, KLAUS-DIETER;KUEHN, INGOLF;JAHNS, EKKEHARD;LACH, CHRISTIAN;KELLER, HARALD;PFAU, ANDREAS;FRECHEN, THOMAS
分类号 F28F19/06;C23C18/16;C23C18/31;C23C18/52;(IPC1-7):C23C18/31;C23C18/18;B01J19/02 主分类号 F28F19/06
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