| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a pattern of very accurate and excellent shape. SOLUTION: An opening formed in a photoresist layer is filled with a non- photosensitive organic film, then the non-photosensitive organic film formed on the photoresist layer is etched back until the photoresist layer is exposed, and all the surface of the photoresist layer is exposed to light and developed, by which the photoresist layer is removed, and a non-photosensitive organic film having a required pattern can be obtained. |
