发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having superior adhesion to a glass substrate, superior developability, heat and solvent resistances and also having stability in long-term storage. SOLUTION: The photosensitive resin composition contains a carboxyl- containing organic binder (A) having a specified molecular weight distribution, an ethylenic unsaturated group-containing compound (B), a photoinitiator (C) consisting of an acetophenone compound and a biimidazole compound, an organic solvent (D) and a pigment (E).
申请公布号 JP2001255652(A) 申请公布日期 2001.09.21
申请号 JP20000052816 申请日期 2000.02.29
申请人 QIMEI INDUSTRY CO LTD 发明人 RI SHUNKEN;SEI BAIKA
分类号 G03F7/033;C08F2/50;G03F7/004;G03F7/027;G03F7/029;G03F7/031 主分类号 G03F7/033
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