发明名称 Method of fabricating triple polysilicon non-volatile memory cells
摘要 A contact-less array of self-aligned, triple polysilicon, source side injection, nonvolatile memory cells with metal-overlaid wordlines includes: a plurality of pairs of stacks of first, second and third layer polysilicon arrange in rows; a drain region between the two stacks in each pair of polysilicon stacks, the drain regions being self-aligned to the edges of the two stacks; and a source region between each of the two adjacent pairs of polysilicon stacks, the source regions being self-aligned to side-wall spacers formed adjacent to edges of the polysilicon stacks such that each source region is laterally spaced an equal distance from the edges of the two stacks of polysilicon between which the source region is located.
申请公布号 US2001021563(A1) 申请公布日期 2001.09.13
申请号 US20010785817 申请日期 2001.02.16
申请人 MA YUEH YALE;FUKUMOTO TAKAHIRO 发明人 MA YUEH YALE;FUKUMOTO TAKAHIRO
分类号 H01L21/28;H01L21/8247;H01L27/115;(IPC1-7):H01L21/20 主分类号 H01L21/28
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