| 摘要 |
A method of improving registration accuracy of a semiconductor device, and a method of forming a pattern on a substrate using the improving method are provided in which an amount of offset in registration can readily be calculated even when a registration accuracy measurement mark has a small step. First, a first resist film covering at least an edge portion of a first registration accuracy measurement mark is formed. Thereafter, using an optical system utilizing interference, a position of the edge portion of the first registration accuracy measurement mark is detected, with the step enlarged seemingly. Thereafter, distance between opposing ends of first and second registration accuracy measurement marks is measured.
|
