发明名称 THIN FILM-TYPE ELECTRON SOURCE AND DISPLAY DEVICE USING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide high heat resistance and to prevent the migration by forming a lower electrode of an electron discharging part with a material having a higher melting point than Al, forming an insulating layer by an anodically oxidized film of Al or Al alloy, and forming a surface side of a protective insulating layer by an anodically oxidized film of Al or an Al alloy. SOLUTION: A metallic film for lower electrode is formed on an insulating board 1 such as glass by using Ta, Ti, Zr, Hf, Nb or their alloys. These materials are an electrode material having a higher melting point than Al, and an insulating layer of high withstand voltage is formed by anodic oxidation. Then a film is formed with an Al-Nd alloy including 2 atomic % Nd as an Al or the Al alloy film used as a material of an anodically oxidized film. Then a part excluding of the lower electrode 9 and an electron discharging part on the Al alloy film 11 masked by a resist 20, is selectively anodically oxidized thickly to form a protective insulating layer 14. As the Al2O3 anode of high withstand voltage is user as the protective insulating layer 14, the leakage of the current can be prevented.</p>
申请公布号 JP2001084891(A) 申请公布日期 2001.03.30
申请号 JP19990259886 申请日期 1999.09.14
申请人 HITACHI LTD 发明人 KUSUNOKI TOSHIAKI;SAGAWA MASAKAZU;SUZUKI MUTSUMI;ISHIZAKA AKITOSHI
分类号 H01J29/04;H01J1/312;H01J31/12;(IPC1-7):H01J1/312 主分类号 H01J29/04
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