Method of and apparatus for developing exposed photoresist to prevent impurity from being attached to a wafer surface,申请号GB20010002564-传众专利搜索

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发明名称	Method of and apparatus for developing exposed photoresist to prevent impurity from being attached to a wafer surface
摘要
申请公布号	GB0102564(D0)	申请公布日期	2001.03.21
申请号	GB20010002564	申请日期	2001.02.01
申请人	NEC CORPORATION	发明人
分类号	G03F7/30;H01L21/027	主分类号	G03F7/30
代理机构		代理人
主权项
地址

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