Substrate exposure device for photolithographic printing plate manufacture, has exposure head supported by ring element for rotation and axial displacement relative to carrier cylinder for exposed substrate

摘要

The substrate exposure device has a carrier cylinder (2) for supporting the substrate and at least one associated exposure head (9), displaced relative to one another in the axial and peripheral directions of the cylinder. Each exposure head is supported by a ring element (11) fitting coaxially around the carrier cylinder and rotated in the peripheral direction of the latter while the carrier cylinder remains stationary.