ELECTROSTATIC ELIMINATOR FOR PLASMA PROCESSING CHAMBER

摘要

PURPOSE: An electrostatic eliminator for plasma processing chamber is provided to easily unload the substrate from the lower electrode after completion of etching process by allowing the electrostatic electricity generated from the substrate and lower electrode to be grounded to the ground surface during etching process. CONSTITUTION: An electrostatic eliminator comprises a relay switch(5) having a ground wire(4) and which connects or disconnects a lower electrode(3) disposed within a processing chamber(1) and a ground surface(6); and a controller(8) for receiving a signal corresponding to opening/closure of reactive gas being supplied from a reactive gas box(9) to the processing chamber and controlling the relay switch. The relay switch is connected to the controller and switched on/off by being controlled by the controller. The controller has a timer(7) so as to adjust on/off time of the relay switch.