CLEANING METHOD OF CONTACT HOLE

摘要

PURPOSE: A cleaning method of contact hole is to prevent corrosion of a metal interconnection line and simultaneously remove polymer and native oxide while removing a photoresist pattern. CONSTITUTION: A cleaning method of contact hole comprises the steps of: etching an insulating layer(12) formed on a metal interconnection line(10) using a photoresist pattern as a mask to form a contact hole(16); and cleaning the contact hole using a mixed cleaning solution including a first solution capable of removing the photoresist pattern, a second solution capable of removing a native oxide layer grown on the bottom place of the contact hole and a third solution capable of preventing the corrosion of the metal interconnection line. The first solution is a solution into which O3 is dissolved in deionized(DI) water.