发明名称 |
CMOS logic gate having buried channel NMOS transistor for semiconductor devices and fabrication method of the same |
摘要 |
A CMOS logic gate for a semiconductor apparatus having a buried channel NMOS transistor and a fabrication method of the same are disclosed. The CMOS logic gate according to the present invention includes a pull up unit gate-connected by an input voltage and pulling up an output voltage, a buried channel NMOS transistor connected with the pull up unit and gate-connected by a power voltage, and a surface channel NMOS transistor connected with the buried channel NMOS transistor and gate-connected by the input voltage for pulling down the output voltage for thereby enhancing a reliability of the CMOS logic gate.
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申请公布号 |
US6081011(A) |
申请公布日期 |
2000.06.27 |
申请号 |
US19980200458 |
申请日期 |
1998.11.27 |
申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
BAE, CHANG-MIN |
分类号 |
H01L21/8238;H01L27/092;H01L29/78;H03K19/0948;(IPC1-7):H01L29/76;H01L29/94 |
主分类号 |
H01L21/8238 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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