发明名称 CMOS logic gate having buried channel NMOS transistor for semiconductor devices and fabrication method of the same
摘要 A CMOS logic gate for a semiconductor apparatus having a buried channel NMOS transistor and a fabrication method of the same are disclosed. The CMOS logic gate according to the present invention includes a pull up unit gate-connected by an input voltage and pulling up an output voltage, a buried channel NMOS transistor connected with the pull up unit and gate-connected by a power voltage, and a surface channel NMOS transistor connected with the buried channel NMOS transistor and gate-connected by the input voltage for pulling down the output voltage for thereby enhancing a reliability of the CMOS logic gate.
申请公布号 US6081011(A) 申请公布日期 2000.06.27
申请号 US19980200458 申请日期 1998.11.27
申请人 HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. 发明人 BAE, CHANG-MIN
分类号 H01L21/8238;H01L27/092;H01L29/78;H03K19/0948;(IPC1-7):H01L29/76;H01L29/94 主分类号 H01L21/8238
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