发明名称 ELECTROLYTIC REFINING OF METAL, USING CATHODE BASE PLATE
摘要 <p>PROBLEM TO BE SOLVED: To reduce troubles such as falling of an electrodeposited metal from a base plate and defectiveness with respect to stripping of the electrodeposited metal from the base plate and to improve the operation rate of a device for a method by stripping an electrodeposited metal from a cathode base plate, thereafter washing the base plate with water by showering the base plate, removing wash water stuck to the base plate through air blowing on the base plate from several small nozzles and thereafter coating the surface of the base plate with a stripping liquid in order to use the base plate as a cathode base plate for the subsequent electrodeposition. SOLUTION: This method comprises: coating the surface of a cathode base plate with a stripping liquid by a spray method or the like; introducing the coated cathode base plate into an electrolytic cell to perform electrolysis and to deposit a metal on the surface of the base plate by electrodeposition; mechanically stripping the electrodeposited metal formed on the cathode base plate; after the stripping, washing the cathode base plate to remove the electrolytic solution such as sulfuric-acidic electrolytic solution, wherein, as the washing method, a water washing method that comprises washing the base plate with water by showering the base plate, is preferred; subsequently, removing wash water stuck to the surface of the cathode base plate by blowing compressed air on the base plate with a blower having vertically-arranged several small nozzles; and then, coating the resulting cathode base plate with the stripping liquid to use the base plate as a cathode base plate for the subsequent electrodeposition. Thus, troubles due to deterioration of the stripping liquid can be reduced.</p>
申请公布号 JP2000160384(A) 申请公布日期 2000.06.13
申请号 JP19980341866 申请日期 1998.12.01
申请人 MITSUI MINING & SMELTING CO LTD 发明人 HAISEI KENJI;MARUYAMA TSUNEO;ONIZUKA TAKAHARU
分类号 C25C1/00;(IPC1-7):C25C1/00 主分类号 C25C1/00
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