| 摘要 |
PURPOSE: Silica film formation solution compositions and a method for manufacturing the same are provided to achieve much improved density to be used for coating films without additional treatments. CONSTITUTION: Silica film formation solution compositions are manufactured by mixing: a first silica film formation solution that is hydrolyzed at 45 to 60 deg.C for 20-60 hours, and contains containing silicon alkoxide, 2-10 mol% of water, 3-7 times of a solvent based on silicon alkoxide, the solvent selected from alcohol, ester, ketone, and aromatic carbon hydroxide, and inorganic catalyst having the initial pH between 1.0 and 3.5; and 30-70 vol% of a secondary silica film formation solution that is hydrolyzed at 45 to 60 deg.C for 4-20 hours, and contains containing silicon alkoxide, 2-10 mol% of water, 3-7 times of a solvent based on silicon alkoxide, the solvent selected from alcohol, ester, ketone, and aromatic carbon hydroxide, and organic catalyst having the initial pH between 1.0 and 3.5.
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