Fabrication process of soi substrate,申请号SG19960011682-传众专利搜索

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发明名称	Fabrication process of soi substrate
摘要
申请公布号	SG71006(A1)	申请公布日期	2000.03.21
申请号	SG19960011682	申请日期	1996.12.12
申请人	CANON KABUSHIKI KAISHA	发明人	ATOJI TADASHI
分类号	H01L21/302;H01L21/02;H01L21/306;H01L21/3065;H01L21/762;H01L27/12;(IPC1-7):H01L21/205;H01L21/20	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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