| 摘要 |
<p>An illuminator for illuminating pattern areas of different types formed on a reticle substantially simultaneously under their optimum illumination conditions. The illuminating light (IL) from an exposure light source (2) is directed to a fly-eye lens (5). The illuminating light emerging from a large number of light source images on the emergence face of the fly-eye lens (5) illuminates a reticle (10) through a condenser lens (9) and so forth. The image of the pattern of the reticle (10) is transferred onto a wafer (12) through a projection optical system (11). Segmental pattern areas of different types are formed in the pattern area of the reticle (10). A fly-eye mask (4) is provided over the incident face of the fly-eye lens (5). The fly-eye mask (4) is divided into a large number of filter elements corresponding to the respective lens elements of the fly-eye lens (5). The filter elements have predetermined transmittance distributions independent of each other according to the illumination conditions of the segmental pattern areas.</p> |
