发明名称 METHOD AND DEVICE FOR PROCESSING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for preventing a processing gas beforehand from leaking to the outside part of a processing chamber, in which a substrate is housed and the pressure is reduced at introducing processing gas to the processing chamber. SOLUTION: The inside part of a processing chamber 32 in which a substrate W is housed is depressurized by an aspirator 22, and when the pressure of the inside part reaches a prescribed pressure, an electromagnetic switching valve 28 is closed. Before a processing gas is introduced into the processing chamber and the substrate is processed, the state is maintained in just for prescribed time period, and after a pressure gauge 30 confirms that the pressure of the inside part of the processing chamber has not changed within the prescribed time, the processing gas is introduced through a gas inlet pipeline 24 into the processing chamber.
申请公布号 JP2000021705(A) 申请公布日期 2000.01.21
申请号 JP19980184920 申请日期 1998.06.30
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 OTANI MASAMI
分类号 G03F7/16;B05C3/00;H01L21/027 主分类号 G03F7/16
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