发明名称 SUBSTRATE RETAINING METHOD AND DEVICE AND EXPOSURE DEVICE WITH SUBSTRATE RETAINING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To prevent the particles of a resist from being generated even if a device is not exchanged and to retain substrates with a plurality of sizes corresponding to diversified substrate dimensions by positioning the edge of the substrates in a space formed by a plurality of projecting substrate supporting parts for retaining the substrates. SOLUTION: A plurality of projecting substrate supporting parts that are formed on nearly a flush plane and are aligned in a matrix are formed on a retaining surface 7 of a substrate retaining device. Then, eight recessed spaces Sa-Sh running in a crosswise direction in a groove shape and six groove-shaped recessed spaces S1-S6 running in a vertical direction are formed on the retention surface 7 by adjacent ones among a plurality of substrate supporting parts 2a1-2i7. Then, the edge part of a glass plate P is located at the recessed spaces Sa-Sh for sucking and retaining the glass plate P, thus retaining substrates with a plurality of sizes corresponding to diversified substrate dimensions by preventing the particles of a resist from being generated even if the device is not exchanged.</p>
申请公布号 JP2000012663(A) 申请公布日期 2000.01.14
申请号 JP19980169696 申请日期 1998.06.17
申请人 NIKON CORP 发明人 AMAMIYA TSUNEHIKO;SHIMIZU KENJI
分类号 G02F1/1333;B23Q3/08;G03F7/20;H01L21/027;H01L21/683;(IPC1-7):H01L21/68;G02F1/133 主分类号 G02F1/1333
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