ETCHING DEVICE AND METHOD FOR OPERATING THE SAME AND MANUFACTURE OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an etching device equipped with a handling arm for reducing any foreign matter accumulated on the surface of the handling arm and for easily removing the foreign matter, and a method for operating the etching device, and a method for manufacturing a semiconductor device. SOLUTION: This is an etching device equipped with a handling arm 1 for carrying a wafer to an etching chamber. A heater 2 and a thermometer 3 are embedded in a handling arm main body 1a of the handling arm 1. Also, a method for operating the etching device includes an operating process for cleaning the handling arm 1 in a state that the handling arm 1 is set at a carrying arm driving body 4 without being removed from the carrying arm driving body 4.