| 摘要 |
PROBLEM TO BE SOLVED: To provide a reticle having a linear pattern which can cause less occurrence of broken lines and excessive exposure and can eliminate the need for formation of a transmission region made of a special material, even when deformation or the like causes an image of a subfield on a mask to be shifted. SOLUTION: Each of overlap regions 120 and 121 with adjacent subfield lines 100 and 110 is arranged to have transmission zone 130 and a mask zone 140. The mask zone 130 is not cut into an island zone by the transmission zone. When the lines 100 and 110 are overlapped such that their positional alignment is accurate, no excessive exposure takes place, because the mask and transmission zones of both lines are complementary. Even when positional alignment is shifted, no broken lines occur with a small double exposed area. |
