发明名称 HEAT TREATING VERTICAL BOAT FOR SEMICONDUCTOR WAFER
摘要 <p>PROBLEM TO BE SOLVED: To provide a heat treating vertical boat of a semiconductor wafer, in which slip pages generated by an inside stress due to the self-weight of a semiconductor wafer can be prevented, and the semiconductor wafer can be automatically carried by a carrying device. SOLUTION: This device is provided with four supporting faces (points) 1, 2, 3, and 4 arranged on the same circumference for supporting a semiconductor wafer SW, and the areas of two triangles constituted by connecting the two supporting faces (points) 1 and 2 provided at the approach front side of the semiconductor wafer SW with one of the supporting faces (points) 3 and 4 at the back side are made the same. Furthermore, the area of each triangle is constituted, so as to be more than 84% of that of an equilateral triangle inscribed to the semiconductor wafer SW.</p>
申请公布号 JPH1140659(A) 申请公布日期 1999.02.12
申请号 JP19970205373 申请日期 1997.07.15
申请人 TOSHIBA CERAMICS CO LTD;TOSHIBA CORP 发明人 SANADA MASAYUKI;KASHIMA KAZUHIKO;HOSOKI YOSHISATO;TSUCHIYA NORIHIKO
分类号 H01L21/683;H01L21/205;H01L21/22;H01L21/31;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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