摘要 |
PURPOSE:To obtain a large power transistor capable of being used to high frequency by forming a groove extending to cross a gate layer having a depth reaching a gate layer in a source layer. CONSTITUTION:A groove 100 extending in a direction to cross a gate layer 3' having a depth reaching a gate 3' is formed at the center in a source layer 4, an aluminum film 9' is arranged along the bottom surface of the groove 100, and is connected to an aluminum electrode 9 for leading a gate lead wire. A P<+> type striped region is formed directly under the film 9'. Eventually, it is formed in a structure in which the source is divided into two segments, source aluminum electrodes 8, 8' are formed thereto, and aluminum is arranged on the P<+> type flat region at the peripheries of the aluminum electrodes. |