| 摘要 |
PROBLEM TO BE SOLVED: To make illumination characteristics such as a radiation region shape of a charged particle beam to each small region on a mask constant without depending on a deflection amount from a light axis in transferring a mask patron through a division transfer method. SOLUTION: An electron beam EB emitted from an dectron gun 10 is focused by condenser lenses 11A, 11B and reaches an aperture plate 31. The electron beam EB which has passed through an opening of the aperture plate 31 is deflected by a first field of view selecting deflector 12A and made into a parallel beam by a condenser lens 11C, and then deflected back by a second field of view selecting deflector 12B to be incident to a radiation region 33 of one of small regions of a mask 1. An projection image of the opening of the aperture plate 31 is the radiation region 33. A shape, position, current density or the like of the radiation region 33 of the electron beam are corrected by an illumination characteristics correction system 30 placed in the vicinity of the inside the condenser lens 11C. |
