| 摘要 |
<p>PURPOSE: To provide an electron emission element having an emitter electrode inclined for a gate electrode with high repeatability and positional accuracy, while the gate electrode being laid to self-match the emitter electrode at an extremely small gap without any restriction by the design rule of the photo-lithograph method. CONSTITUTION: A substrate 1, an insulation layer 2 and a gate electrode 3 are stacked in order, and the electrode 3 and the layer 2 are provided with an aperture A of such depth as reaching the substrate 1. Also, an emitter electrode 4 is stacked on the substrate 1 within the aperture A, so as not to come in contact with the gate electrode 3. In addition, a recess 1a of inverted conical type is formed on the substrate 1 and, then, the emitter electrode 4 is formed along the slope of the recess 1a. In this case, the peripheral section 4a of the electrode 4 is projected from the upper end of the substrate recess 1a.</p> |
