SUPPRESSION OF ARC IN PLASMA PROCESSING SYSTEM,申请号JP19950012751-传众专利搜索

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发明名称	SUPPRESSION OF ARC IN PLASMA PROCESSING SYSTEM
摘要
申请公布号	JPH0851101(A)	申请公布日期	1996.02.20
申请号	JP19950012751	申请日期	1995.01.30
申请人	APPLIED MATERIALS INC	发明人	JIERARUDO TSUEYAO IN
分类号	H05H1/46;C23F4/00;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):H01L21/306	主分类号	H05H1/46
代理机构		代理人
主权项
地址

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