| 摘要 |
PURPOSE:To obtain this resist compsn. excellent in balance of various properties such as sensitivity, resolution, gamma-value, heat resistance, profile and the depth of focus and free from residue on development by using a specified compd. of novolak type resin, using a methylol compd. CONSTITUTION:This resist compsn. contains a photosensitive agent and alkali- soluble novolak resin. The photosensitive agent is 1,2- naphthoquinonediazidosulfonic ester of novolak type resin obtd. by allowing a methylol compd. represented by formula I to react with phenol represented by formula II in the presence of an acid catalyst. The novolak type resin consists of >=50wt.% tetranuclear compd. represented by formula III, <=10wt.% low mol.wt. component having a lower mol.wt. than the tetranuclear compd. and <=40wt.% high mol.wt. component having a higher mol.wt. than the tetranuclear compd. In the formulae I-III, each of R1-R10 is alkoxy, alkyl, hydroxyl, etc. |
