发明名称 DYNAMIC AMOUNT SENSOR
摘要 PURPOSE:To obtain a sensor at a high yield that has an excellent impact resistance against the dynamic amount in the reverse direction to a substrate by providing stopper on either of fixed electrodes so that the displacement in the approximately vertical direction of the substrate on a beam-like structure may be regulated. CONSTITUTION:A sensor 30 detects the change in electrostatic capacity between a beam-like structure 13 and a fixed electrode 33 and between the structure 13 and a fixed electrode 35 in order to find out the dynamic amount applied to the sensor 30 itself. A stopper 31 for regulating the change to a substrate 11 of the structure 13 and its reverse side is provided a part of the electrode 33 adjacent to the structure 13. Therefore, when the sensor 30 is applied with a dynamic amount in a direction where the structure 13 is displaced to the substrate 11 and the reverse side thereof, the stopper will regulate the displacement, thereby not leaving the structure 13 away from the substrate 11. The stopper 31 is provided on a part of a plurality of fixed electrodes 33 and the quantity of stoppers 31 is determined depending on required durability.
申请公布号 JPH06180261(A) 申请公布日期 1994.06.28
申请号 JP19920334748 申请日期 1992.12.15
申请人 MURATA MFG CO LTD 发明人 KOBAYASHI SHINJI
分类号 G01P15/125;G01L9/12;(IPC1-7):G01L9/12 主分类号 G01P15/125
代理机构 代理人
主权项
地址