发明名称 METHOD AND DEVICE FOR USING EDGE RETAINER OF POLISHING HEAD
摘要 PURPOSE: To correctly position a semiconductor wafer by protruding a retainer over a carrier to form a pocket for the wafer, and providing a connector for mounting the wafer on the carrier. CONSTITUTION: An interfering mechanical construction means forms a required position relation between a carrier 28 and a retainer 27 against pressure difference between both sides of a diaphragm 29 (connector). During polishing work, it is freely moved to equalize pressure applied from a head 12 on a wafer. A mounting position is where the retainer 27 is protruded over the carrier 28 to compose a pocket to contain the disc-shaped wafer for mounting the wafer. A polishing position is where the retainer floats to the carrier during real polishing work. An insert position is where the interfering mechanical construction means protrudes the carrier 28 over the retainer 27 to get in contact with the surface of the carrier 28 for the purpose of replacement of an insert 30 or the like.
申请公布号 JPH0679618(A) 申请公布日期 1994.03.22
申请号 JP19920340788 申请日期 1992.12.21
申请人 SAIBETSUKU SYST 发明人 NOOMU SHIENDON;KENISU SHII SUTORUBUEN;ROBAATO JIEI KORENKAU
分类号 B24B37/30;H01L21/304 主分类号 B24B37/30
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