发明名称 |
METHOD FOR REMOVING DEFECT OF DIAMOND |
摘要 |
PURPOSE:To eliminate lattice defects and non-diamond components existing in diamond by irradiating diamond or a diamond thin film on a substrate material with ultraviolet ray. CONSTITUTION:Diamond or a diamond thin film 101 on a substrate material (102 is non-diamond component; 103 is lattice defect) is irradiated with ultraviolet ray 104 to obtain a diamond 105 free from the defects 102, 103. The energy density of the ultraviolet ray is preferably 0.1-10J/cm<2> and the ultraviolet ray is preferably excimer laser light. When an atmosphere containing at least hydrogen or at least oxygen is used as the atmosphere for the ultraviolet irradiation, the removal of the graphite and amorphous carbon component is facilitated because the components are reacted and evaporated in the form of hydrocarbon or an oxide such as carbon monoxide. |
申请公布号 |
JPH0648716(A) |
申请公布日期 |
1994.02.22 |
申请号 |
JP19920198591 |
申请日期 |
1992.07.24 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
DEGUCHI MASAHIRO;KITAHATA MAKOTO;HIRAO TAKASHI |
分类号 |
C01B31/06;C30B29/04 |
主分类号 |
C01B31/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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