发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain a photosensitive resin compsn. useful as a liquid photosolder resist excellent in UV curing property which enables formation of picture images by exposure to UV rays and development with a dilute alkali soln. after a film is formed. CONSTITUTION:This photosensitive resin compsn. contains a reaction product obtd. by adding a compd. of formula IV to a part of carboxyl groups of copolymers of formulae I, II, and III, diluent, and photoinitiator. In formulae I-III, R1 is a hydrogen atom or methyl group, and R2 is an aliphatic hydrocarbon group of 1-6 carbon number. In formula IV, R1 is same as in formulae I-III, R3 is an aliphatic hydrocarbon group or aromatic hydrocarbon group of 1-12 carbon number.
申请公布号 JPH0619135(A) 申请公布日期 1994.01.28
申请号 JP19920177032 申请日期 1992.07.03
申请人 TAMURA KAKEN KK 发明人 YANAGAWA MAKOTO;MITSUFUJI SHINJI
分类号 G03F7/004;G03F7/038;H01L21/027;H05K3/06;H05K3/28;(IPC1-7):G03F7/038 主分类号 G03F7/004
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